Systems Private Limited
Atomic Force Microscope
The wafer-level atomic force microscope uses a micro-cantilever probe structure to characterize the three-dimensional appearance of solid materials such as conductors, semiconductors, and insulators, and can test large wafer-level samples.
The electric sample positioning stage combined with optical imaging can achieve a positioning accuracy of 1 µm in a 300X300 mm area. The probe approach and scanning parameter adjustment are fully automated, and the imaging resolution can reach 20 picometers.
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Features
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Advanced functions: testing of physical quantities such as Young's modulus, adhesion, magnetic domain, surface potential, work function, etc.;
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2Adaptable environment: compatible with accessories such as culture dishes and heating tables, supporting underwater and high-temperature environment measurements;
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Intelligent needle insertion: intelligent one-key needle insertion can be achieved with a piezoelectric scanning tube;
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Adaptable size: 12-inch wafer and backward compatible with various wafer sizes.
Technical indicators
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Noise level in XY direction: 0.2 nm closed loop, 0.02 nm open loop;
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Noise level in Z direction: 0.06 nm closed loop, 0.03 nm open loop;
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Nonlinearity: 0.15% in XY direction, 1% in Z direction;
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Scanning mode: XYZ full probe scanning mode, the sample remains stationary during scanning;
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Scanning range: 90 μm×90 μm×9 μm;
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Scanning rate: 0.1 Hz~30 Hz;
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Image sampling points: 32×32~4000×4000;
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Sample size: 12-inch wafer is backward compatible with 8, 6, 4-inch and fragment samples;
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Working mode: contact, tapping, non-contact;
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Adaptive environment: air, liquid phase;
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Multifunctional measurement: electrostatic force microscope (EFM), scanning Kelvin microscope (KPFM), piezoelectric force microscope (PFM), conductive atomic force microscope (C-AFM), scanning capacitive force microscope (SCFM), magnetic force microscope (MFM), lateral force microscope (LFM), nano-etching/processing, single-point force spectrum curve, force modulation mode;
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Optional: fully automatic loading and unloading;
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Fully automatic probe approach system: 35 mm stroke, step accuracy 50 nm.